JPH026216B2 - - Google Patents

Info

Publication number
JPH026216B2
JPH026216B2 JP55078463A JP7846380A JPH026216B2 JP H026216 B2 JPH026216 B2 JP H026216B2 JP 55078463 A JP55078463 A JP 55078463A JP 7846380 A JP7846380 A JP 7846380A JP H026216 B2 JPH026216 B2 JP H026216B2
Authority
JP
Japan
Prior art keywords
radiation
optical
written
detection device
pattern writing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55078463A
Other languages
English (en)
Japanese (ja)
Other versions
JPS562632A (en
Inventor
Bitekoeku Sutefuan
Adorufuasu Fuaaneru Teodorasu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Publication of JPS562632A publication Critical patent/JPS562632A/ja
Publication of JPH026216B2 publication Critical patent/JPH026216B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Electron Beam Exposure (AREA)
JP7846380A 1979-06-12 1980-06-12 Device for writing pattern Granted JPS562632A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7904580A NL7904580A (nl) 1979-06-12 1979-06-12 Inrichting voor het schrijven van patronen in een laag op een substraat met een bundel elektrisch geladen deeltjes.

Publications (2)

Publication Number Publication Date
JPS562632A JPS562632A (en) 1981-01-12
JPH026216B2 true JPH026216B2 (en]) 1990-02-08

Family

ID=19833338

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7846380A Granted JPS562632A (en) 1979-06-12 1980-06-12 Device for writing pattern

Country Status (7)

Country Link
US (1) US4334139A (en])
JP (1) JPS562632A (en])
CA (1) CA1150861A (en])
DE (1) DE3021612A1 (en])
FR (1) FR2458894A1 (en])
GB (1) GB2055195B (en])
NL (1) NL7904580A (en])

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4468565A (en) * 1981-12-31 1984-08-28 International Business Machines Corporation Automatic focus and deflection correction in E-beam system using optical target height measurements
US4572956A (en) * 1982-08-31 1986-02-25 Tokyo Shibaura Denki Kabushiki Kaisha Electron beam pattern transfer system having an autofocusing mechanism
JPS59150422A (ja) * 1983-01-31 1984-08-28 Fujitsu Ltd 露光処理方法
GB2141000B (en) * 1983-04-28 1986-10-08 Canon Kk Automatic focus
US4620288A (en) * 1983-10-26 1986-10-28 American Semiconductor Equipment Technologies Data handling system for a pattern generator
JPS60183505A (ja) * 1984-03-02 1985-09-19 Nippon Telegr & Teleph Corp <Ntt> ウエハの高さ測定器
IT1179924B (it) * 1984-05-22 1987-09-16 Prima Progetti Spa Testa focalizzatrice per una macchina da taglio a raggi laser
JPS6134936A (ja) * 1984-07-26 1986-02-19 Hitachi Ltd 電子線描画装置における試料面高さ補正方法
JPS61129825A (ja) * 1984-11-29 1986-06-17 Toshiba Mach Co Ltd 電子ビ−ム露光装置
EP0197221B1 (en) * 1985-03-15 1989-06-28 Kabushiki Kaisha Toshiba Device for measuring the position of an object
US4771010A (en) * 1986-11-21 1988-09-13 Xerox Corporation Energy beam induced layer disordering (EBILD)
JP2714009B2 (ja) * 1988-07-15 1998-02-16 株式会社日立製作所 荷電ビーム装置
JP2960746B2 (ja) * 1990-03-15 1999-10-12 株式会社日立製作所 ビーム照射方法および電子ビーム描画方法とビーム照射装置並びに電子ビーム描画装置
US5025165A (en) * 1990-03-26 1991-06-18 At&T Bell Laboratories Method for producing a semiconductor device using an electron beam exposure tool and apparatus for producing the device
JP3036081B2 (ja) * 1990-12-01 2000-04-24 株式会社日立製作所 電子線描画装置及び方法、及びその試料面高さ測定装置
JPH0613013A (ja) * 1992-06-29 1994-01-21 Sumitomo Electric Ind Ltd イオンビームを集束して加工を行う装置
JP3101539B2 (ja) * 1994-06-24 2000-10-23 インターナショナル・ビジネス・マシーンズ・コーポレ−ション 電子線ナノメトロジー・システム
KR0156800B1 (ko) * 1995-02-10 1998-12-15 이대원 레이저 다이오드를 이용한 자동 초점 조절 장치
US5757015A (en) 1995-06-08 1998-05-26 Fujitsu Limited Charged-particle-beam exposure device and charged-particle-beam exposure method
US5830612A (en) 1996-01-24 1998-11-03 Fujitsu Limited Method of detecting a deficiency in a charged-particle-beam exposure mask
US6335532B1 (en) 1998-02-27 2002-01-01 Hitachi, Ltd. Convergent charged particle beam apparatus and inspection method using same
EP1202776A1 (en) * 1999-06-16 2002-05-08 Norsam Technologies Method apparatus and article of manufacture for a branding diamond branding with a focused ion beam
CN1938925A (zh) 2004-03-31 2007-03-28 Tdk株式会社 噪声抑制电路
US7358169B2 (en) * 2005-04-13 2008-04-15 Hewlett-Packard Development Company, L.P. Laser-assisted deposition
CN115326745A (zh) * 2022-08-03 2022-11-11 温州智点信息科技有限公司 一种电力安全工器具的THz时域光谱的无损检测方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL260910A (en]) * 1960-02-06
NL285495A (en]) * 1961-11-18
US3648048A (en) * 1969-10-15 1972-03-07 Thomson Houston Comp Francaise System and method for positioning a wafer coated with photoresist and for controlling the displacements of said wafer in a scanning electron apparatus
US3902036A (en) * 1974-05-02 1975-08-26 Western Electric Co Control system using multiplexed laser beams
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
JPS52103965A (en) * 1976-02-25 1977-08-31 Toshiba Corp Electron beam projector unit
JPS5398781A (en) * 1976-11-25 1978-08-29 Jeol Ltd Electron ray exposure unit
DE2656730A1 (de) * 1976-12-15 1978-06-22 Philips Patentverwaltung Optisches abstandsmessystem zur automatischen fokussierung in optischen speichersystemen

Also Published As

Publication number Publication date
CA1150861A (en) 1983-07-26
GB2055195A (en) 1981-02-25
GB2055195B (en) 1983-04-27
NL7904580A (nl) 1980-12-16
JPS562632A (en) 1981-01-12
FR2458894A1 (fr) 1981-01-02
DE3021612C2 (en]) 1988-11-17
DE3021612A1 (de) 1980-12-18
FR2458894B1 (en]) 1984-05-18
US4334139A (en) 1982-06-08

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